UV 레이저를 이용한 다 층막의 선택적 직접가공 공정연구

• 영문명: Selective direct patterning process of multi-layer using UV laser
• 발행기관: 한국레이저가공학회
• 저자명: 정영모(Y. M. Jeong) 안중용(J. Y. An) 김두영(D. Y. Kim) 백광열(K. Y. Baek) 김종원(J. W. Kim) 강형식(H. S. Kang) 홍순국(S. K. Hong)
• 간행물 정보: 『한국레이저가공학회 학술대회 논문집』2007년도 추계학술발표대회 논문집, 82~85쪽, 전체 4쪽
• 주제분류: 공학 > 기계공학
• 파일형태: PDF
• 발행일자: 2007.11.30

영문 초록

  A traditional SiNx pattern making processes require PR coating, exposure, develop, etching and PR strip. This causes high equipment cost, running cost and environment pollution. A selective layer direct patterning with mask projection method can be the good alternatives for those typical processes to overcome the above issues. The patterns on a small mask are projected onto a substrate by the almost homogenized beam of UV Excimer laser. This process can ablate only the selected layers clearly by the required depth. The experimental investigations are discussed for obtaining the optimal process condition to ablate selectively the multiple layers in this paper.

목차

ABSTRACT
1. 서론
2. 실험 장치
3. 결과 및 고찰
4. 결론
5. 참고문헌

키워드

Mask Projection Ultra Violet (UV) Excimer laser Silicon Nitride