Recent Progress in Electroless Plating of Copper

• 발행기관: 한국마이크로전자및패키징학회
• 저자명: Ashutosh Sharma Chu-Seon Cheon Jae Pil Jung
• 간행물 정보: 『마이크로전자 및 패키징학회지』제23권 제4호, 1~6쪽, 전체 6쪽
• 주제분류: 공학 > 산업공학
• 파일형태: PDF
• 발행일자: 2016.12.31

영문 초록

In this article, the recent developments in electroless plating of copper, electroless bath formulation and effect of plating parameters have been reviewed. Cyanide free electroless baths are now being developed and studied due to the various environmental concerns. Various organic chemicals such as complexing agents, reducing agents, and additives such as poly-alcohols and aromatic ring compounds have been added to copper plating baths for promising results. The effects of various reducing and complexing agents, bath conditions like additives, bath pH, and composition have been summarized. Finally the applications of the electroless plating of copper and latest developments have been overviewed for further guidance in this field.

목차

1. Introduction

2. Electroless Copper Plating

3. Plating Baths

4. Applications of Copper Electroless Plating

5. Conclusion

Acknowledgements

References

키워드

Electroless additives plating copper complexing agents temperature