폐놀계 화합물과 포름알데히드의 축합반응으로부터 노볼락 레진의 합성

• 영문명: Synthesis of novolac resins by condensation of phenolic compounds with formaldehyde
• 발행기관: 한국응용과학기술학회 (구.한국유화학회)
• 저자명: 이종대(Lee JongDae) 이태준(Lee TaeJun) 이창훈(Lee ChangHoon) 조경태(Cho KyungTae)
• 간행물 정보: 『한국응용과학기술학회지』한국유화학회지 제24권 제3호, 309~318쪽, 전체 10쪽
• 주제분류: 공학 > 화학공학
• 파일형태: PDF
• 발행일자: 2007.09.30

영문 초록

Novolac is widely used as the primary solid component of most photoresists in semiconductor and microelectronic devices. In this study, novolac resins were prepared by condensation of 35% formaldehyde with phenolic compounds such as m-/p-cresol, 2,5-dimethylphenol and bisphenol A in the presence of oxalic acid as catalyst. The average molecular weight (Mw) of these novolac resins has been varied on the changing of mixing ratio of m-/p-cresol/2,5-dimethylphenol/bisphenol A or formaldehyde/phenolic compound. Also, thermal properties of novolac were observed by TGA.

키워드

novolac formaldehyde 2,5-dimethylphenol bisphenol A photoresist