전자소자 응용을 위한 소프트 리소그라피 기반 나노 소재 패터닝

• 영문명: Nanomaterials Patterning based on Soft Lithography for Electronic Applications
• 발행기관: 한국세라믹학회
• 저자명: 김세진(Sejin Kim) 강주훈(Joohoon Kang)
• 간행물 정보: 『세라미스트』제28권 제1호, 37~51쪽, 전체 15쪽
• 주제분류: 공학 > 화학공학
• 파일형태: PDF
• 발행일자: 2025.03.31

국문 초록

Soft lithography has emerged as a versatile and cost-effective technique for patterning nanomaterials, offering multiple advantages over traditional photolithography in terms of material compatibility, simplicity, and cost efficiency. This review article aims to highlight recent developments in soft lithography methods, including nanoimprint lithography, capillary force lithography, soft stencil lithography, microcontact lithography, laser-assisted transfer lithography, and intaglio transfer lithography. Fundamental principles, unique features, and advantages of each technique are discussed along with their applications in nanomaterial patterning. Furthermore, the integration of these methods with advanced electronic devices is investigated, emphasizing their potential to achieve high-resolution patterning while preserving nanomaterial integrity. This review is concluded with insights into the future prospects of soft lithography as a pivotal tool to replace photolithography in next-generation electronic device fabrication, particularly for flexible and wearable applications.

목차

1. 서론

2. 본론

3. Applications

4. 결론

ACKNOWLEDGEMENTS

REFERENCES

키워드

Nanomaterial Patterning Soft-lithography