급속열처리 방법에 의한 Indium Tin Oxide Films의 제조 및 특성평가

• 영문명: Preparation and Evaluation of the Properties of Indium Tin Oxide Films Deposition by Rapid Thermal Annealing
• 발행기관: 한국산업기술융합학회(구. 산업기술교육훈련학회)
• 저자명: 김성진(Sung-Jin Kim) 박형호(Hyung-Ho Park) 최균(Kyoon Choi)
• 간행물 정보: 『산업기술연구논문지』산업기술교육훈련논문지 제16권 3호, 137~143쪽, 전체 7쪽
• 주제분류: 공학 > 산업공학
• 파일형태: PDF
• 발행일자: 2011.09.30

영문 초록

ITO/glass thin films were prepared by RF magnetron sputtering method and some of the samples were treated by rapid thermal annealing(RTA) and process at same temperatures ranging of 500℃. The effects of RTA treatment on the structural properties were studied by using X-ray diffraction and atomic force microscopy while optical properties were studied by the photoluminescence measurements. It is observed that the ITO film annealed at 500℃ at 5minmute nitrogen ambient gas reveals the strongest XRD emission intensity and narrowest full width at half maximum among the temperature studied. The enhanced UV emission from the film annealed at 500℃ 5minmute nitrogen ambient gas is attributed to the improved crystalline quality of ITO film due to the effective relaxation of residual compressive stress and achieving maximum grain size.

목차

Ⅰ. 서 론

Ⅱ. 실 험

Ⅲ. 결과 및 고찰

Ⅳ. 열처리 시간에 따른 미세 조직의 변화 및 상변이 모델

Ⅴ. 결 론

키워드

ITO Thin Films(ITO 박막 필름) Rapid Thermal Annealing(급속열처리) RF Magnetron Sputteing(고주파 마그네트론 스퍼터링 장비) XRD(X-선 회절분석 )