DUV 레이저를 이용한 Pentacene 박막의 어블레이션

• 영문명: DUV Laser Ablation of Pentacene film on Glass Substrate
• 발행기관: 한국레이저가공학회
• 저자명: 김두영(D.Y. Kim) 백광열(K.Y. Baek) 안중용(J.Y. An) 김종원(J.W. Kim) 강형식(H.S. Kang) 홍순국(S.K. Hong)
• 간행물 정보: 『한국레이저가공학회 학술대회 논문집』2007년도 춘계학술발표대회 논문집, 152~154쪽, 전체 3쪽
• 주제분류: 공학 > 기계공학
• 파일형태: PDF
• 발행일자: 2007.06.30

영문 초록

  In this study, the pentacene patterning is performed using Deep Ultra Violet (DUV) excimer laser and mask projection technique. The pentacene, organic material is used as an active layer of Organic Thin Film Transistor (OTFT) because of their high carrier mobility (＞1.5㎠/Vs) characteristic and OTFT has used as an operating device in the backplane of flexible display. Conventional fabrication of pentacene pattern is vacuum plating using mask. It has limitation for the fine pattern. However, excimer laser patterning can make finer pattern and minimize solvent damage for the plastic substrate by elimination of developing and stripping. This paper shows the feasibility of direct and fine patterning of organic layer with DUV laser.

목차

ABSTRACT
1. 서론
2. 실험 장치
3. 결과 및 토의
4. 결론
References

키워드

Organic Thin Film Transistor(OTFT) Pentacene Deep Ultra Violet(DUV) excimer laser mask projection method